论文标题
在3D拓扑绝缘子BI2SE3中观察到使用薄MGF2层使用多光子泵送的UV-VIS瞬时吸收光谱镜头涂覆的超湿孔动力学
Observation of ultraslow hole dynamics in the 3D topological insulator Bi2Se3 coated with a thin MgF2 layer using multiphoton pumped UV-Vis transient absorption spectroscopy
论文作者
论文摘要
由于它们的重叠,很少观察到光泵的半导体中电子和孔的单独放松动力学。在这里,我们报告了在室温下在室温下观察到的长寿命(〜200 MKS)孔的个体动力学,该动力学在10 nm厚的3D拓扑绝缘子(TI)BI2SE3的厚膜中使用瞬时吸收光谱层涂有10 nm厚的MGF2层。通过在BI2SE3/MGF2界面上施加一定的波长,在Bi2Se3中的多光子谐振泵送Bi2Se3中的无质量零毛膜和绑定的价电子,可以观察到Ultraslow孔动力学。胶片中电子的新兴缺陷使剩余的孔不可能重新组合,从而导致其在特定探测波长下测量的超声动力学。我们还发现,对于这种超声光响应,这是由于在价带最大值处的较大的自旋轨道耦合(SOC)分裂以及拆分组件之间所得的间隔散射所致。由于BI2SE3/MGF2界面的存在,BI2SE3中的Ultraslow孔动力学比SI/SIO2界面处已知的Ultraslow Electron Dynamics的速度快得多,这也是由SI中的Multiphoton激发引起的。由于2d Ti Bi2Se3(膜厚度5、4和2 nm)的BI2SE3膜厚度的降低,观察到的长孔的动力学逐渐被抑制,这是由于dirac表面状态节点上的间隙打开引起的多孔光发射的谐振条件的丧失。这种行为表明,大规模迪拉克费米子的动力学主要决定了2D拓扑上非平地和二维拓扑绝缘阶段的光激发载体的松弛。
Individual relaxation dynamics of electrons and holes in optically pumped semiconductors is rarely observed due to their overlap. Here we report the individual dynamics of long-lived (~200 mks) holes observed at room temperature in a 10 nm thick film of the 3D topological insulator (TI) Bi2Se3 coated with a 10 nm thick MgF2 layer using transient absorption spectroscopy in the UV-Vis region. The ultraslow hole dynamics was observed by applying multiphoton resonant pumping of massless Dirac fermions and bound valence electrons in Bi2Se3 at a certain wavelength sufficient for their photoemission and subsequent trapping at the Bi2Se3/MgF2 interface. The emerging deficit of electrons in the film makes it impossible for the remaining holes to recombine, thus causing their ultraslow dynamics measured at a specific probing wavelength. We also found an extremely long rise time (~600 ps) for this ultraslow optical response, which is due to the large spin-orbit coupling (SOC) splitting at the valence band maximum and the resulting intervalley scattering between the splitting components. The ultraslow hole dynamics in Bi2Se3 due to the presence of the Bi2Se3/MgF2 interface is nevertheless much faster than the known ultraslow electron dynamics at the Si/SiO2 interface, also induced by multiphoton excitation in Si. The observed dynamics of long-lived holes is gradually suppressed with decreasing Bi2Se3 film thickness for the 2D TI Bi2Se3 (film thickness 5, 4, and 2 nm) due to the loss of resonance conditions for multiphoton photoemission caused by the gap opening at the Dirac surface state nodes. This behavior indicates that the dynamics of massive Dirac fermions predominantly determines the relaxation of photoexcited carriers for both the 2D topologically nontrivial and 2D topologically trivial insulator phases.