论文标题

石墨烯 - 症状会接触

Graphene-Semiconductor Contact

论文作者

Javadi, M.

论文摘要

提出了石墨烯 - 官方连接的系统处理。石墨烯的费米水平上状态的有限密度导致石墨烯 - 轴导剂界面处的外来电子性质。通常,由于石墨烯的内部潜力,Schottky-mott限制和屏障高度的总和是违反的。通过融合半导体 - 肺导体和金属 - 轴导剂连接的主要特征,可以将石墨烯 - 触发器接触视为前所未有的\ emph {semimetal-semicductor-ninction}的原型。广义界面方程揭示了连接特性与石墨烯中电荷载体密度的耦合。可以证明,可调屏障高度的众所周知的效果与连接电容直接相关。此外,研究了图像强度效应在屏障可调性下的相对影响。详细讨论了发挥内置潜力,障碍高度和电容的实验方法。同样,通过分析实验数据,可以发现石墨烯 - 硅样品界面上强反转层的发展。

A systematic treatment of graphene-semiconductor junction is presented. Finite density of states at the Fermi level of graphene leads to exotic electronic properties at graphene-semiconductor interface. Quite generally, the Schottky-Mott limit and the sum rule of barrier heights are violated due to the internal potential of graphene. By merging the principal characteristics of semiconductor-semiconductor and metal-semiconductor junctions, the graphene-semiconductor contact may be considered as an archetype of unprecedented \emph{semimetal-semiconductor junction}. Generalized interface equations disclose the coupling of junction characteristics with the density of charge carriers in graphene. It will be shown that the well-known effect of tunable barrier height is directly related to the junction capacitance. Furthermore, the relative impact of image-force effect in the presence of barrier tunability is investigated. Experimental methods to gain built-in potential, barrier height, and capacitance of the junction are discussed in detail. Also the development of strong inversion layer at the interface of graphene-silicon samples is uncovered by analyzing experimental data.

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