论文标题
金属delafossite pdcro $ _2 $电影的脉冲激光外观
Pulsed-laser epitaxy of metallic delafossite PdCrO$_2$ films
论文作者
论文摘要
在Delafossite PDCRO2中发现的磁性三角形层的高度传导金属层的替代堆叠为发现有趣的相关量子现象提供了一个绝佳的平台。材料的薄膜生长不仅可以使超出大块材料所表现出的基本物理特性,还可以通过与不同的材料接口来开发新型混合材料,而且事实证明这是极具挑战性的。在这里,我们报告了脉冲激光外观(PLE)的金属Delafoss PDCRO2膜的外延生长。 PLE生长条件,外延菌株以及底物的化学和结构特征的基本作用是通过在各种生长条件下以及各种类型底物生长来研究的。虽然菌株在改善晶体方面起着重要作用,但没有杂质阶段的外延PDCRO2膜的直接生长并不成功。我们将这种困难归因于底物之间的化学和结构差异和PDO层的挥发性性质,这使得正确相的成核难度。通过在PDCRO2生长之前种植Cucro2缓冲层层,克服了这一困难。与PDCRO2不同,Cucro2膜相当容易生长,并具有相对较宽的生长窗口。只有单层厚的缓冲层足以生长正确的PDCRO2相。该结果表明,基于PD的Delafossites的外观对界面的化学和结构极为敏感,因此需要接近完美的底物材料。所得膜相应地紧张,并在40 K处显示出抗磁磁过渡,持续的厚度较薄,厚度为3.6 nm。
Alternate stacking of a highly conducting metallic layer with a magnetic triangular layer found in delafossite PdCrO2 provides an excellent platform for discovering intriguing correlated quantum phenomena. Thin film growth of the material may enable not only tuning the basic physical properties beyond what bulk materials can exhibit, but also developing novel hybrid materials by interfacing with dissimilar materials, yet this has proven to be extremely challenging. Here, we report the epitaxial growth of metallic delafossite PdCrO2 films by pulsed laser epitaxy (PLE). The fundamental role of the PLE growth conditions, epitaxial strain, and chemical and structural characteristics of the substrate is investigated by growing under various growth conditions and on various types of substrates. While strain plays a large role in improving the crystallinities, the direct growth of epitaxial PdCrO2 films without impurity phases was not successful. We attribute this difficulty to both the chemical and structural dissimilarities between the substrates and volatile nature of PdO layer, which make nucleation of the right phase difficult. This difficulty was overcome by growing CuCrO2 buffer layers before PdCrO2 were grown. Unlike PdCrO2, CuCrO2 films were rather readily grown with a relatively wide growth window. Only monolayer thick buffer layer was sufficient to grow the correct PdCrO2 phase. This result indicates that the epitaxy of Pd-based delafossites is extremely sensitive to the chemistry and structure of the interface, necessitating near perfect substrate materials. The resulting films are commensurately strained and show an antiferromagnetic transition at 40 K that persists down to as thin as 3.6 nm in thickness.