论文标题
使用密度函数理论的内在电子缺陷状态
Intrinsic Electronic Defect States of Anatase using Density Functional Theory
论文作者
论文摘要
在这项工作中,使用Hubbard校正(DFT+U)的帮助,使用密度函数理论计算了包括各种固有缺陷的位置和形成能的整体电子结构。此处考虑的内在点缺陷是氧空位($ v_o $),氧气间隙($ o_i $),钛空缺($ v_ {ti} $)和钛间隙($ ti_i $)。在此处考虑的所有内在缺陷中,$ v_ {ti} $和$ ti_i $在平衡条件下最稳定。鉴于剖析酶中的传导带主要由ti 3d组成,其中具有O 2p状态的次要组成部分,而Valence频带则主要由O 2P组成,其ti 3D状态的较小贡献。 $ v_o $和$ ti_i $在乐队间隙中形成本地状态。此外,可以看到有效质量的各向异性。最后,使用平板 - 苏皮尔计算中的真空电位作为参考,对所有固有缺陷状态的带图进行对齐。第一项主要研究将有助于理解缺陷引起的对释放酶进行过渡的绝缘,这将对光催化和光电子区域产生重大影响。
In this work an overall electronic structure including the position and formation energies of various intrinsic defects are computed for anatase using Density Functional Theory aided by Hubbard correction (DFT+U). The intrinsic point defects considered here are, oxygen vacancy ($V_O$), oxygen interstitial ($O_i$), titanium vacancy ($V_{Ti}$) and titanium interstitial ($Ti_i$). Out of all the intrinsic defects considered here, $V_{Ti}$ and $Ti_i$ are found to be most stable under equilibrium condition. Whereas, conduction band in anatase is consisted of mainly Ti 3d with a minor component of O 2p states, valence band is found to be mainly composed of O 2p with a minor contribution from Ti 3d states. $V_O$ and $Ti_i$ are found to form localized states in the band gap. Moreover, anisotropy in the effective mass is seen. Finally, an alignment of band diagrams for all the intrinsic defect states is performed using vacuum potential from slab-supercell calculation as reference. This first principle study would help in the understanding of defect-induced insulating to conducting transition in anatase, which would have significant impact in the photocatalytic and optoelectronic area.