论文标题
铜薄膜沉积通过本地不平衡的DC磁控溅射系统
Copper Thin Film Deposition by An Indigenous Unbalanced Type DC Magnetron Sputtering System
论文作者
论文摘要
铜沉积已在载玻片和硅底物上使用本地开发不平衡的DC Magnetron溅射系统进行。这项工作的主要目的是研究沉积材料的晶体结构，并计算晶粒晶粒尺寸。作为过渡金属，铜纳米颗粒和结构在照片催化和传感器应用领域具有多个公用事业。这种结构用于提供自由电子，以增强光催化传感器序列的光学和电气性能。这些纳米催化剂提高了流行的光催化剂石墨碳氮化物的沉积速率和成核。在这项工作中，通过使用X射线荧光和X射线衍射仪来表征合成的铜薄膜。
Copper deposition has been carried out at various time span on glass slide and silicon substrate by using indigenously developed unbalanced type DC magnetron sputtering system. The main objective of this work is to study the crystalline structure of the deposited materials and also to calculate the crystallite grain size. As a transition metal, Copper nano-particles and structures have several utilities in the field of photo-catalytic and sensor applications. Such structures are utilized to provide free electrons that enhance optical and electrical properties of the photo-catalytic sensor mate-rials. These nano-catalysts enhance deposition rate and nucleation of graphitic Carbon Nitride, a popular photo-catalyst. In this work, synthesized Copper thin film has been characterized by using X-Ray Fluorescence and X-Ray Diffractometer.
